Thin Films Deposition

Thanks to a Packet 21 project (financed by ARIS), a new system for thin films deposition was purchased from PREVAC

With this system it is possible to grow of thin films of:

• magnetic materials (either alloys or layers of Fe, Ni, or co-doped with transition metals)
• oxides (like alumina and indium tin oxide),
• dielectrics for applications in devices.

For better stochiometry control, better crystallinity, and film homogeneity, it is possible to use reactive sputtering with nitrogen or oxygen gas, heat the sample, apply a bias to the substrate, or use an ion source, which will help in both cleaning and improving the quality.

The system hosts:

• 4 magnetrons that can be operated either in DC or RF mode
• Ion source
• Sample heater, T up to 900 C
• Motorised masking shutter
• Sample bias
• Glovebox from "Inert" for substrate preparation

For access: Contact dr. Barbara Ressel (barbara.resselATung.si) or dr. Andraž Mavrič (andraz.mavricATung.si)